Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist (Q56592379)
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Current Data About Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist
(P31) (Q13442814)

(P304) C6C58-C6C62

(P433) 6

(P478) 28

(P577) +2010-11-00T00:00:00Z

(P1433) (Q27724301)

(P1476) "Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist" (language: en)

(P2093) Huigao Duan
(P1545) 1

Donald Winston
(P1545) 2

Joel K. W. Yang
(P1545) 3

Bryan M. Cord
(P1545) 4

Vitor R. Manfrinato
(P1545) 5

Karl K. Berggren
(P1545) 6

other details